Thick Aluminum Nitride Substrate for RTP Furnace's Sample Holder - EQ-AIN-Holder Orientation 10-14

Thick Aluminum Nitride Substrate for RTP Furnace's Sample Holder - EQ-AIN-Holder Orientation 10-14Such unpolished Aluminum Nitride can be placed in the center of holder for holding test samples up to 3" or 5" diam. The excellent temperature uniformity can be achieved in this 3" or 5" diam. area due to the benefit from its high thermal conductivity. Aluminum Nitride Ceramic Substrates Properties Item No. AIN Holder Purity (wt%) 99% (AN5116) Density (g cm3) >3. 26 Thermal Conductivity (W m. K) >170 Thermal Expansion (x10 6 oC) <4. 2 Dielectric

005 Cu (wt%) <0

1100°C ( continuous)

Surface Roughness:   Fine ground

000 PSI adjust relief valve is available upon request

Stainless steel torsion clips hold the bonnet assembly firmly in place and allow quick access for maintenance cycles

and show instant humidity and temperature

Resistivity:                             (2

MTI's high vacuum pump with KF40 port to 80mm OD tube furnace with KF40 flange

EPI polished  on one side or two sides to Ra < 10 Å

Vacuum chuck Dimensions: 370mm(L) x 200mm(W)

Chemical Formula Na2Mn[Fe(CN)6] Powder Color Light Gery/White

Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A