T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer
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Description
T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass WaferThis Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification
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• Extension of recipe identification capability
and other methods of measuring static charge as well as the performance parameters of static-control methods
This Safety Guideline provides guidance for the safety evaluation of load ports and wafer handling robots before integration
It intends to produce economic benefits for both manufacturers and equipment suppliers by identifying a subset of relevant functionalities out of the existing SEMI Communications Standards for the application in HB-LED manufacturing facilities
This Guide references SEMI E78
It is not intended to distinguish good from bad or desirable from undesirable
This Guide provides information about the frequency and location of sampling for those parameters that are not available from online analyzers
Current edition approved by the North American Regional Standards Committee on August 28
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Such standards are intended to promote cost-effective interfacing while preserving freedom of choice in material handling equipment
This Document describes the procedure for determination of the moisture dry-down characteristics (quantity of removable moisture) of surface mount (integrated gas delivery systems) and conventional gas delivery systems using cavity ring down spectroscopy (CRDS) analyzers
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