MF156900 - SEMI MF1569 - Guide for Generation of Consensus Reference Materials for Semiconductor Technology Revision:SEMI MF1569-94 (Reapproved 1999) - Superseded the material resistivity may be

the material resistivity may be determined from this carrier density using SEMI MF723

SEMI E33 — Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility

This Guide can be applied to inline equipment as well as batch equipment

SEMI D20 — Terminology for FPD Mask Defect

This Document accomplishes this by defining an operational model for AMHS SEM equipment as viewed by a factory automation controller (Host)

MF156900 - SEMI MF1569 - Guide for Generation of Consensus Reference Materials for Semiconductor Technology Revision:SEMI MF1569-94 (Reapproved 1999) - Superseded the material resistivity may beThis Guide covers the steps to be taken to generate a set of ConRefs for a specific property or family of related properties required in semiconductor technology. The procedure for generating the set of ConRefs is based on interlaboratory testing in accordance with ASTM E691. It is assumed for the purposes of this Guide that the test method evaluated by the interlaboratory study (ILS) is appropriate for determining the property values of the ConRef.